MO-Optics – customized illumination for SUSS MicroTec Mask Aligners

SUSS MicroTec, supplier of equipment solutions for 3D integration, MEMS, advanced packaging and nanotechnology markets, has launched MO-Optics, a new illumination system for all generations of manual and automatic SUSS Mask Aligners. MO-Optics provides higher intensity, improved exposure light uniformity and customized illumination shaping to further optimize the process window and yield in contact and proximity lithography. The new optics is based on microlens arrays.

MO-Optics provides a library of illumination settings, including all well-established SUSS MicroTec Mask Aligner settings like A-Optics, D-Optics, LGO and HR; plus additional settings like ring illumination, Dipole, Quadrupole, Multipole and Maltese Cross. A choice of optimized illumination settings, like e.g. ring illumination for vias and Maltese Cross for vertical and horizontal lines increases depth of focus and exposure latitude while reducing mask error factors. SUSS MicroTec also supports users who wish to design fully made-to-order illumination that optimizes their layer-specific process windows.

“MO-Optics is a major step forward in yield improvements providing high resolution at even large proximity gaps for all our Mask Aligners”, explains Dr. Ralf Süss, General Manager of SUSS MicroTec’s Lithography Division.

SUSS MicroTec Lithography GmbH
Brigitte Wehrmann
brigitte.wehrmann@suss.com
www.suss.com