SONOSYS Ultraschallsysteme GmbH

mastering NanoClean together
LinkedIn

W3 Fair+Convention 2020

Booth A26

As first European company in the global market SONOSYS® provides ultrasonic cleaning systems in the frequency range from 400 kHz to 5 MHz.
SONOSYS® Megasonic systems provide highly efficient removal
of nano sized particles from substrates, semiconductor wafers, masks, MEMS and LIGA. Our products are used in different markets (e. g. Semiconductor industry, Food industry, Optical industry, Solar Cells and Sonochemistry). Available products: Transducer plates, Submersible Transducer, Face-To-Face Transducer, Single and Dual Nozzles, Atomizer and very compact, modular Generators up to 2000 W.

High frequency ultrasonic cleaning systems - this is our strength! In close partnerships with research institutes and our customers, complementary abilities are converted into synergistic benefits for better solutions. The result is the most compact megasonic generator and transducer in the world with a unique design. SONOSYS® has mastered, like no other company, the manufacturing of high-frequency ultrasonic systems in the range between 400 kHz and 9 MHz . Let's "master nanoClean together", which is the guiding motto of SONOSYS®. Our main markets are wafer cleaning (semiconductor), microstructures/MEMS, LIGA technology, solar/PV and optics.

Products

SONOSYS® systems:

  • Megasonic Transducer plates
  • Megasonic Submersible transducers
  • Face-to-face transducers
  • Megasonic Single-/Dual-/Triple-Nozzles
  • Shower nozzles
  • Megasonic generators
  • Atomizers

Services

rental of megasonic systems for trial applications

General Information

SONOSYS Ultraschallsysteme GmbH
IVAM member
Daimlerstr. 6
75305 Neuenbuerg
Germany
Number of Employees: 8
Founding Year: 1995

Contact

Ralf Emberger
+49 7082 7918 40

Latest news

Ultrasonic and megasonic in the fight against Corona: disinfectant mist and quality control of protective masks
10.04.2020 The nebulizers of Sonosys GmbH have been used long before the coronavirus crisis to nebulize and distribute disinfectant solutions. 
NanoClean, wafer cleaning, megasonics, photomask cleaning