EVG signs a collaboration agreement with Eulitha to establish low-cost-of-ownership nanopatterning solution for high-brightness LED manufacturing

EV Group, a leading supplier of wafer bonding and lithography equipment for the MEMS, nanotechnology and semiconductor markets, has signed a joint-development and licensing agreement with Eulitha AG, a pioneer and leader in the production of high-quality nanostructures using advanced lithography techniques. EVG will integrate Eulitha’s PHABLE mask-based ultraviolet photolithography technology with its EVG 620 automated mask alignment systems with the goal of developing a low-cost-of-ownership nanopatterning solution to enable the production of high-brightness light emitting diodes (HB-LEDs).

The solution, which can already be demonstrated, allows the low-cost, automated fabrication of photonic nanostructures over large areas. It combines the low cost, ease-of-use and non-contact capabilities of proximity lithography with sub-micron resolution making it ideally suited for use in patterning sapphire substrates in order to enhance the light extraction of LED devices.

The synergies of both companies’ respective technologies have great potential to provide the resolution and volume-production capabilities of lithography steppers at a fraction of the cost-enabling LED, optics and photonics manufacturers with extremely tight cost constraints the opportunity to extend their technology roadmaps to higher levels of performance.”

Contact: Clemens Schütte, EV Group
C.Schuette@EVGroup.com