Vertical furnace for batch production of 200 mm silicon wafers

centrotherm thermal solutions GmbH & Co. KG has presented the "verticoo 200", a new, high-capacity vertical furnace for the batch production of 200 mm silicon wafers, at SEMICON Europa 2007. The single-tube vertical furnace is a double boat system with fully automated wafer loading system, and is designed for maximum throughput and an optimum price-performance-ratio. The integrated storage for up to 20 wafer cassettes makes automatic (un)loading processes of entire boats possible.

"Depending on the respective process, up to 175 wafers per batch can be processed", says centrotherm’s CEO Dr. Harald Binder. The revised design of the process chamber and the heating system allow a high degree of flexibility for all standard processes – in the normal pressure as well as in the low pressure range. The clientele is to a large extent made up of power semiconductor producers and automotive manufacturers, and both groups are currently investing heavily in state-of-the-art technology.

The vertical furnace is designed for side-by-side-installation and sports an extremely small footprint of less than 3 sqm. It is easy to maintain and can be used reliably for many process steps in the semiconductor fabrication – for example annealing, diffusion or oxidation. Even LPCVD processes such as polysilicon, doped polysilicon, silicon nitride, and silicon oxynitride are possible.

centrotherm thermal solutions GmbH + Co. KG
Julia Seyffer
info@centrotherm-ts.de
www.centrotherm-ts.de