IVAM Microtechnology Network
The increasing integration of smallest structures in semiconductors and microsystems is resulting in higher cleaning requirements. The newly developed Megasonic system from SONOSYS uses a frequency of two megahertz to remove particles with sizes down to the nano range without damaging the substrate.
Avoiding damage even to the finest structures is a challenge for cleaning systems that work on the micro level. An ultrasonic cleaning system with an operating frequency in the megahertz range is far superior to conventional low-frequency ultrasonic methods that use, for example, 40 kilohertz. Due to the much lower cavitation energy, microstructures are not destroyed, and the cleaning process is optimized.
The hermetically encapsulated transducers in stainless steel or plastic are suitable for integration into existing baths, either on the bottom or on the side walls. In addition to the standard versions for 4", 6" and 8" substrates, the submersible transducers can also be dimensioned to customer requirements.
SONOSYS Ultraschallsysteme GmbH
www.sonosys.de
The Fraunhofer Institute for Electronic Nano Systems ENAS in Chemnitz is expanding its strategic collaborations in Southeast Asia. In October …
The first Chemnitzer Seminar of the year 2025 is entitled “Test and Reliability Solutions – new opportunities for electronic components …
With support from the Fraunhofer Institute for Reliability and Microintegration IZM, the start-up Zn2H2 is developing a new generation of …
.jpg)
 (1).1.png)
