May 6, 2010

“Thin Film Powerhouse” Evatec cooperates with CORIAL

Source: Evatech
May 6, 2010

Evatec delivers complete process solutions for thin film deposition and etching to the optical and semiconductor industries around the globe. The company has signed an agreement with CORIAL, specialist in RIE, ICP, HDP and PECVD plasma etching and deposition equipment, on delivering processes and platforms for the compound semiconductor, LED and MEMS markets.

Amongst the first customer gains will be the availability of CORIALs plasma technology capability on Evatec’s new Radiance cluster tool. Company CEOs Andreas Waelti and Marc Derbey commented that the agreement brought significant steps forward for both companies in meeting the demands for their many shared customers. “Our cooperation will extend far beyond addition of CORIAL’s plasma technology to Evatec’s existing process platforms and we will build on the strengths of both companies to create a “Thin Film Powerhouse” for high performance processes. The new agreement means we can offer our customers seamless transition in process and production platform whatever their volumes in typical applications including sensors, displays and MEMS“.

However, the cooperation will extend beyond technology and the two companies will strengthen their links through a common sales and service organisation in many markets around the globe.  “The first steps have already been taken to build up local process support capability in key Asian markets as we support our customer’s rapid production expansion in LED production”, said Evatec CEO Andreas Waelti.

Evatec Thinfilm Technology GmbH
Ralf Eichert
info@ettnet.de
www.ettnet.de

 

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